Overdamped Josephson junctions based on a Nb/Al-AlOx/Nb superconductor-normal metal-insulator-superconductor structure were realized at the submicrometer scale by using focused ion beam nano-sculpting technique. This approach represents an alternative solution to the classical electron beam lithography and allows for an accurate control of the junction dimensions. Superconductor-normal metal-insulator-superconductor structured junctions were downscaled to about 300 x 300 nm(2) and electrically measured at 4.2 K. The simple fabrication process, leading to high current density, J(c), and characteristic voltage, V-c, values and good uniformity, makes these junctions promising as elementary cell in complex circuits for rapid single flux quantum and ac voltage standard applications.
Nano SNIS Junctions Fabricated by 3D FIB Sculpting for Application to Digital Electronics / Fretto, MATTEO ANDREA; Enrico, Emanuele; DE LEO, Maria; Boarino, Luca; Rocci, R; Lacquaniti, Vincenzo. - In: IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY. - ISSN 1051-8223. - 23:3(2013), pp. 1101104.101-1101104.104. [10.1109/TASC.2013.2240759]
Nano SNIS Junctions Fabricated by 3D FIB Sculpting for Application to Digital Electronics
FRETTO, MATTEO ANDREA;ENRICO, EMANUELE;DE LEO, MARIA;BOARINO, LUCA;Rocci, R;LACQUANITI, VINCENZO
2013
Abstract
Overdamped Josephson junctions based on a Nb/Al-AlOx/Nb superconductor-normal metal-insulator-superconductor structure were realized at the submicrometer scale by using focused ion beam nano-sculpting technique. This approach represents an alternative solution to the classical electron beam lithography and allows for an accurate control of the junction dimensions. Superconductor-normal metal-insulator-superconductor structured junctions were downscaled to about 300 x 300 nm(2) and electrically measured at 4.2 K. The simple fabrication process, leading to high current density, J(c), and characteristic voltage, V-c, values and good uniformity, makes these junctions promising as elementary cell in complex circuits for rapid single flux quantum and ac voltage standard applications.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.